Yeongju, South Korea

Hang-Ryong Lim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hang-Ryong Lim

Introduction

Hang-Ryong Lim is a notable inventor based in Yeongju, South Korea. He has made significant contributions to the field of technology, particularly through his work at Samsung Electronics Co., Ltd. His innovative spirit is reflected in his patent, which addresses critical aspects of substrate handling.

Latest Patents

One of Hang-Ryong Lim's key patents is for a substrate carrier. This substrate carrier includes a carrier body and a first sensor unit. The carrier body is designed with an internal space, an inlet port, and an outlet port. The internal space is configured to receive a substrate, while a purge gas can be introduced through the inlet port. Additionally, gas within the internal space can be exhausted through the outlet port. The first sensor unit, located at the outlet port, is designed to detect environmental properties of the internal space in real time. This innovation allows for the accurate identification of the generation or cause of contaminants within the carrier body.

Career Highlights

Hang-Ryong Lim has established himself as a valuable asset at Samsung Electronics Co., Ltd. His work has contributed to advancements in technology and has positioned him as a key figure in the development of innovative solutions in the industry.

Collaborations

He has collaborated with talented coworkers, including Se-Won Ko and Yoon-Mi Lee, to further enhance the impact of their collective work in the field.

Conclusion

Hang-Ryong Lim's contributions to technology through his patent for a substrate carrier exemplify his innovative mindset and dedication to improving industry standards. His work continues to influence advancements in substrate handling and environmental monitoring.

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