Singapore, Singapore

Hang-Ru Goy

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hang-Ru Goy. Retrieved from https://idiyas.com/inventor/hang-ru-goy-onwe44hk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hang-Ru Goy

Introduction

Hang-Ru Goy is a notable inventor based in Singapore, recognized for his contributions to fluid ejection technology. He has made significant strides in the field, particularly through his innovative patent that enhances the efficiency of fluid ejection systems.

Latest Patents

One of Hang-Ru Goy's key patents is titled "Fluid ejection apparatus including a parasitic resistor." This invention features a fluid ejection apparatus that incorporates a first firing resistor and a second firing resistor. These components work together to selectively cause fluid to be ejected through a single nozzle. Additionally, the apparatus includes a parasitic resistor that adds a parasitic resistance to the first firing resistor, improving the overall functionality of the device. This patent showcases Goy's ingenuity and understanding of fluid dynamics.

Career Highlights

Hang-Ru Goy is currently employed at Hewlett-Packard Development Company, L.P., where he continues to innovate and develop new technologies. His work at HP has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to the industry.

Collaborations

Some of Hang-Ru Goy's coworkers include Ning Ge and Boon Bing Ng. Their collaborative efforts have likely played a role in advancing the projects they work on together.

Conclusion

Hang-Ru Goy's innovative spirit and dedication to his work have made him a valuable asset in the field of fluid ejection technology. His patent and contributions reflect his expertise and commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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