Hong Kong, China

Hang Ching Kwok

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Profit Royal Pharmaceutical Limited. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hang Ching Kwok. Retrieved from https://idiyas.com/inventor/hang-ching-kwok

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2019

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Hang Ching Kwok in Protective Mask Technology

Introduction

Hang Ching Kwok is an innovative inventor based in Hong Kong, CN. He has made significant contributions to the field of protective mask technology. His work focuses on enhancing the effectiveness of masks through advanced materials and formulations.

Latest Patents

Kwok holds a patent for "Protective masks with coating comprising different electrospun fibers interweaved with each other, formulations forming the same, and method of producing thereof." This invention provides a protective mask with an ultrafine fibrous coating. The coating includes partially gelled submicron fibers interweaved with nanofibers, along with a biocide that is encapsulated, surface-attached, blended, physically trapped, or chemically linked to the fibers. The design allows for a protective mask that meets N95 level protection and possesses bacteria-killing capabilities.

Career Highlights

Kwok is associated with Profit Royal Pharmaceutical Limited, where he continues to develop innovative solutions in the pharmaceutical and protective equipment sectors. His work has garnered attention for its potential impact on public health and safety.

Collaborations

Kwok collaborates with talented individuals such as Ho Wang Tong and Sau Kuen Connie Kwok, who contribute to the research and development efforts in his projects.

Conclusion

Hang Ching Kwok's innovative approach to protective mask technology exemplifies the importance of research and development in enhancing public health safety. His contributions are paving the way for more effective protective equipment in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…