This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hanearl Jung and Substrate Processing Innovation.
Introduction
Hanearl Jung is an inventor based in Suwon, South Korea. His listed patent work concerns methods and equipment for cleaning substrates during processing.
Latest Patents
Jung is associated with 1 patent, titled “Substrate Processing Apparatus, Cleaning Substrate Processing Apparatus Cleaning Method, and Substrate Processing Method Including the Same.” The disclosed cleaning method inserts a boat into a process tube, then removes deposited materials through two successive removal processes. The first process supplies the tube with a first gas, and the second supplies it with a second gas. One gas is chlorine-based, while the other is fluorine-based.
Career Highlights
Jung is associated with Samsung Electronics Ltd. His patent describes a staged approach to removing different deposited materials from a process tube, using gases with distinct chemical properties.
Collaborations
The listed coworkers associated with Jung are Woong Lee and Giduck Kweon.
Conclusion
Hanearl Jung’s patent work focuses on substrate-processing equipment and a two-stage cleaning method that uses chlorine-based and fluorine-based gases to remove deposited materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile