Company Filing History:
Years Active: 2019-2025
Title: Han Wang: Innovator in Semiconductor Processing
Introduction
Han Wang is a prominent inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor processing, holding a total of 7 patents. His innovative methods have advanced the technology used in the manufacturing of semiconductor devices.
Latest Patents
One of Han Wang's latest patents is titled "Methods for removing deposits on the surface of a chamber component." This patent describes a method for effectively removing deposits from the surface of a chamber component. The process involves fixing the chamber component in a fixture and applying a slurry with a pH of about 5 to 9. The surface is then polished using a polish pad and the slurry, ensuring that the surface roughness remains within about 10% of its original state. An alternative method involves heating the chamber component to temperatures between 500° C. and 1500° C.
Another notable patent is "Integrated low k recovery and ALD metal deposition process for advanced technology node." This method includes positioning a substrate within a processing chamber and cleaning it to form a cleaned substrate. The process further involves exposing the cleaned substrate to a recovery precursor and UV light to create a treated substrate, which is then coated with a liner layer via atomic layer deposition (ALD).
Career Highlights
Han Wang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Han has collaborated with notable colleagues, including David Walter Groechel and Tuochuan Huang. These collaborations have contributed to the advancement of technologies in the semiconductor field.
Conclusion
Han Wang's contributions to semiconductor processing through his innovative patents and work at Applied Materials, Inc. highlight his significant impact on the industry. His methods for improving the manufacturing process continue to shape the future of semiconductor technology.