Company Filing History:
Years Active: 2016
Title: Han-Ming Hsieh: Innovator in Overlay Sampling Methodology
Introduction
Han-Ming Hsieh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methodologies. His work focuses on enhancing manufacturing processes while maintaining efficiency.
Latest Patents
Han-Ming Hsieh holds a patent for an "Overlay Sampling Methodology." This invention relates to a method designed to achieve enhanced overlay control while maintaining manufacturing throughput in fabrication processes. The methodology involves determining the locations of alignment structures on a wafer, measuring the wafer's topography, and projecting a modeled wafer map to minimize discrepancies in alignment. This approach ensures that subsequent fabrication steps are not delayed, thereby optimizing the overall manufacturing process.
Career Highlights
Hsieh has dedicated his career to advancing semiconductor technologies. He is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and improve fabrication techniques. His expertise in overlay control has positioned him as a valuable asset in the industry.
Collaborations
Throughout his career, Han-Ming Hsieh has collaborated with notable colleagues, including Li-Shiuan Chen and Chung-Hao Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Han-Ming Hsieh's contributions to the field of semiconductor manufacturing through his patent on overlay sampling methodology exemplify his commitment to innovation. His work not only enhances manufacturing processes but also sets a standard for future advancements in the industry.