Kaohsiung, Taiwan

Han-Jung Chang

This inventor holds 1 USPTO granted patent. Top assignee: National Sun Yat-Sen University of Kaohsiung. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Han-Jung Chang. Retrieved from https://idiyas.com/inventor/han-jung-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Han-Jung Chang: Pioneering Laser Interference Lithography

Introduction: Han-Jung Chang is an accomplished inventor based in Kaohsiung, Taiwan, who has made significant strides in the field of laser technology. With a keen focus on advancing lithography systems, he has developed a groundbreaking patent that enhances the precision and quality of laser applications.

Latest Patents: Han-Jung Chang holds a notable patent for a "Laser interference lithography system with flat-top intensity profile." This innovative system consists of a laser source that emits a coherent laser beam, a series of beam expanders, and a refractive beam shaper that transforms the typical Gaussian intensity profile of the laser beam into a flat-top profile. The design also includes a sample holder for substrates and reflectors that help create the final interference pattern on the substrate, marking a significant improvement in the lithography process.

Career Highlights: Han-Jung Chang is affiliated with National Sun Yat-sen University, where he contributes to pioneering research in the area of laser technologies. His expertise in laser interference lithography has positioned him as an important figure in technological advancements, enabling more precise manufacturing processes across various industries.

Collaborations: In his work, Han-Jung collaborates closely with his coworker, Yung-Jr Hung. Together, they are pushing the boundaries of laser applications and contributing to the academic community’s understanding of laser interference and its potential in practical scenarios.

Conclusion: Han-Jung Chang's contributions to the field of laser interference lithography illustrate the vital role of innovation in technology. His patent not only reflects his ingenuity but also opens new avenues for research and development within laser applications. As he continues his work at National Sun Yat-sen University, the future holds great promise for further advancements stemming from his inventive spirit.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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