Eindhoven, Netherlands

Han E H Meijer

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: ETH Zurich. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Han E H Meijer. Retrieved from https://idiyas.com/inventor/han-e-h-meijer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Han E H Meijer: Innovator in Polymer Technology

Introduction

Han E H Meijer is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of polymer technology, particularly through his innovative patent.

Latest Patents

Han E H Meijer holds a patent titled "Polymer articles, and methods and dies for making the same." This patent provides dies that have a first section for orienting material being pressed through the die and a second section for shaping the oriented material into a desired form. In one embodiment, the surface area for shaping the oriented material is limited. The patent also includes polymer articles and processes for making the same, with processes that employ the dies.

Career Highlights

Han E H Meijer is associated with the prestigious Eidgenössische Technische Hochschule Zürich, where he contributes to research and development in polymer technology. His work has implications for various applications in the industry.

Collaborations

He has collaborated with notable colleagues such as Jerome P Lefevre and Kirill Feldman, enhancing the scope and impact of his research.

Conclusion

Han E H Meijer is a distinguished inventor whose work in polymer technology continues to influence the field. His innovative approaches and collaborations highlight his commitment to advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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