This inventor holds 1 USPTO granted patent. Top assignee: Nan Ya Technology Corporation. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Han Chih Lin: Innovator in Photoresist Technology
Introduction
Han Chih Lin is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of photoresist technology, particularly in enhancing the planarity of photoresists used in semiconductor manufacturing. His innovative approach has implications for improving the quality and efficiency of electronic devices.
Latest Patents
Han Chih Lin holds a patent titled "Method of providing planarity of a photoresist." This patent describes a method for improving the planarity of a photoresist by modifying the surface of a silicon oxide layer before coating. This modification enhances the adhesion between the silicon oxide layer and the photoresist. As a result, the photoresist flows into the trenches of the silicon oxide layer, achieving good planarity even after a baking process. He has 1 patent to his name.
Career Highlights
Han Chih Lin is currently employed at Nan Ya Technology Corporation, where he continues to work on advancements in semiconductor materials. His expertise in photoresist technology has positioned him as a valuable asset in the industry.
Collaborations
Some of his coworkers include Tzu Ching Tsai and Hui Min Mao, who collaborate with him on various projects within the company.
Conclusion
Han Chih Lin's contributions to photoresist technology demonstrate his innovative spirit and commitment to advancing semiconductor manufacturing processes. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile