This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2000.
Company Filing History:
Years Active: 2000
Title: Innovations by Han-Chang Wu in Pressure Monitoring Technology.
Introduction
Han-Chang Wu is an accomplished inventor based in Taipei, Taiwan. He has made significant contributions to the field of pressure monitoring technology. His innovative approach has led to the development of a unique device that enhances the ability to monitor pressure variations effectively.
Latest Patents
Han-Chang Wu holds a patent for a "Non-intrusive pressure variation monitoring device adapted to monitor." This device is designed to measure the pressure variation of an object. It includes an abutting device that detects pressure changes, generating a displacement in response to these variations. A magnet is supported on the abutting device, allowing it to move in response to pressure changes. The device also features a coil that surrounds the magnet, enabling relative movement. An oscillation circuit is coupled to the coil to generate an oscillation signal. Additionally, a signal processing unit processes this signal to provide an output, which is displayed for easy reading of the pressure variation.
Career Highlights
Throughout his career, Han-Chang Wu has demonstrated a commitment to innovation and excellence in his field. His work has not only advanced technology but has also contributed to the understanding of pressure monitoring systems. His patent reflects his dedication to creating practical solutions for real-world applications.
Collaborations
Han-Chang Wu has collaborated with notable colleagues, including Shuenn-Tsong Young and Chih-Lung Lin. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.
Conclusion
Han-Chang Wu's contributions to pressure monitoring technology exemplify the spirit of innovation. His patented device represents a significant advancement in the field, showcasing his ability to create effective solutions. His work continues to inspire future developments in pressure monitoring systems.