Company Filing History:
Years Active: 2007
Title: Han Biebuyck: Innovator in Patterning Methods
Introduction
Han Biebuyck is a notable inventor based in Rockville, MD (US). He has made significant contributions to the field of patterning methods, particularly through his innovative patent. His work is recognized within the industry, and he is associated with a prominent company.
Latest Patents
Han Biebuyck holds a patent for a method related to creating a pattern on a substrate. This method involves a first alignment structure and utilizes an elastomeric stamp that comprises a patterning structure and a second alignment structure. The process includes a moving step for positioning the elastomeric stamp towards the substrate, followed by a deformation step that deforms the patterning structure using a tensile or compressive force generated by the cooperation of the two alignment structures. This patent showcases his expertise and innovative approach in the field.
Career Highlights
Han Biebuyck is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to further develop his skills and contribute to cutting-edge technologies. His career is marked by a commitment to innovation and excellence in his field.
Collaborations
Throughout his career, Han has collaborated with notable colleagues, including Gian-Luca Bona and Bruno Michel. These collaborations have likely enriched his work and contributed to the advancement of technology in patterning methods.
Conclusion
Han Biebuyck is a distinguished inventor whose work in patterning methods has made a significant impact in the field. His innovative patent and collaboration with esteemed colleagues highlight his contributions to technology and innovation.