The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
May. 28, 2003
Gian-luca Bona, San Jose, CA (US);
Bruno Michel, Adliswil, CH;
Hugo Eric Rothuizen, Adliswil, CH;
Peter Vettiger, Langnau am Albis, CH;
Han Biebuyck, Rockville, MD (US);
Gian-Luca Bona, San Jose, CA (US);
Bruno Michel, Adliswil, CH;
Hugo Eric Rothuizen, Adliswil, CH;
Peter Vettiger, Langnau am Albis, CH;
Han Biebuyck, Rockville, MD (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention relates to a method for creating a pattern on a substrate comprising a first alignment structure, using an elastomeric stamp comprising a patterning structure and a second alignment structure. The method comprises a moving step for moving the elastomeric stamp towards the substrate, and a deformation step for deforming the patterning structure with a tensile or compressive force generated by cooperation of the first alignment structure and the second alignment structure.