Location History:
- Redwood City, CA (US) (2000)
- Belmont, CA (US) (2005)
Company Filing History:
Years Active: 2000-2005
Title: Hali J Forstner: Innovator in Material Processing Technologies
Introduction
Hali J Forstner is a notable inventor based in Redwood City, CA (US). He has made significant contributions to the field of material processing, particularly in the development of methods that enhance the efficiency and effectiveness of semiconductor manufacturing. With a total of 2 patents, Forstner's work has had a meaningful impact on the industry.
Latest Patents
Forstner's latest patents include a "Method and apparatus for planarization of a material by growing a sacrificial film with customized thickness profile." This innovative method allows for the formation of oxide in a way that has a planarizing effect on the underlying material, such as silicon. The process involves growing an oxide with a nonuniform thickness profile that is tailored to match the underlying material's profile. The subsequent removal of the oxide results in a smoother, planarized surface compared to the pre-oxidized state. Another significant patent is the "Method of cleaning CVD cold-wall chamber and exhaust lines." This method addresses the challenge of cleaning post-deposition deposits from a processing chamber by utilizing chlorine gas to form radicals that react with the deposits, ensuring a cleaner processing environment.
Career Highlights
Hali J Forstner is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that improve manufacturing processes and product quality. Forstner's expertise in material processing has positioned him as a valuable asset to his team and the company.
Collaborations
Forstner has collaborated with several talented individuals in his field, including Paul B Comita and Rekha Ranganathan. These collaborations have fostered innovation and contributed to the successful development of new technologies.
Conclusion
Hali J Forstner's contributions to material processing technologies through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of material processing.