Goyang, South Korea

HakJung Kim

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: HakJung Kim. Retrieved from https://idiyas.com/inventor/hakjung-kim-b3cft8ni

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: The Innovations of HakJung Kim

Introduction

HakJung Kim is a prominent inventor based in Goyang-si, South Korea. He has made significant contributions to the field of technology, particularly in the development of graphical user interfaces. With a total of 2 patents to his name, Kim continues to push the boundaries of innovation.

Latest Patents

One of HakJung Kim's latest patents is a display screen or portion thereof with a graphical user interface. This invention showcases his expertise in creating user-friendly interfaces that enhance the interaction between users and devices. His work in this area is crucial for the advancement of modern technology.

Career Highlights

HakJung Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His role at Samsung allows him to collaborate with some of the brightest minds in technology, furthering his impact on the field.

Collaborations

Throughout his career, Kim has worked alongside talented colleagues such as Byeongyong Jeon and Youngcheol Kang. These collaborations have fostered an environment of creativity and innovation, leading to groundbreaking advancements in technology.

Conclusion

HakJung Kim's contributions to the field of technology, particularly through his patents and collaborations, highlight his role as a key innovator. His work continues to influence the development of user interfaces, making technology more accessible and efficient for users.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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