This inventor holds 2 USPTO granted patents. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2019-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019-2020
Title: Hak-Yeol Choi: Innovations in 3D Model Watermarking
Introduction
Hak-Yeol Choi is an inventor based in Daejeon, South Korea. His work includes methods for embedding watermarks in three-dimensional (3D) mesh models and models prepared for 3D printing. He is associated with the Korea Advanced Institute of Science and Technology and holds 2 patents.
Latest Patents
**Three-dimensional mesh model watermarking method using segmentation and apparatus thereof.** This invention describes a method for embedding a watermark in a 3D mesh model. It calculates a geometric primitive, divides the model into mesh segments, converts those segments into a vertex-distance-based coordinate system, and inserts a predetermined watermark. The watermarked segments are then restored to a Cartesian coordinate system.
**Watermark embedding method and apparatus, and watermark detecting method and apparatus for a 3D printing environment.** This invention aligns a layered 3D model with the printing direction, then embeds a patterned watermark in a direction orthogonal to that direction. The approach is designed to keep the watermark independent of the printing direction.
Career Highlights
Choi’s patent work addresses watermarking techniques for digital 3D models and 3D-printing workflows. His inventions describe ways to embed watermarks while accounting for mesh geometry, model segmentation, and printing orientation.
Collaborations
Choi’s listed coworkers include Jong-Uk Hou and Heung-Kyu Lee. His institutional affiliation is the Korea Advanced Institute of Science and Technology.
Conclusion
Hak-Yeol Choi’s patents focus on practical watermarking methods for 3D mesh models and 3D-printing environments, with techniques designed to accommodate both model geometry and printing direction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
