Seongnam, South Korea

Hak Lee

This inventor holds 1 USPTO granted patent. Top assignee: Nexon Korea Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hak Lee. Retrieved from https://idiyas.com/inventor/hak-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 14.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Hak Lee - Innovator in Advertisement Management Technology

Introduction

Hak Lee is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of advertisement management through his innovative patent. His work focuses on enhancing the efficiency of advertisement delivery in gaming environments.

Latest Patents

Hak Lee holds a patent for an "Advertisement management device managing advertisement provided via platform server and operation method of advertisement management device." This invention outlines a method for managing advertisements based on user log data collected from games. The process involves setting up user groups, registering advertisement information, and obtaining feedback from multiple platform servers to optimize advertisement management.

Career Highlights

Hak Lee is currently employed at Nexon Korea Corporation, a leading company in the gaming industry. His role involves leveraging his expertise in advertisement technology to improve user engagement and advertising effectiveness within games.

Collaborations

Some of Hak Lee's notable coworkers include Do Ho Lee and Gi Hye Kim, who contribute to the innovative environment at Nexon Korea Corporation.

Conclusion

Hak Lee's work in advertisement management technology showcases his commitment to enhancing user experiences in gaming. His innovative patent reflects the potential for improved advertisement strategies in the digital landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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