Hak Fei Poon

Title: Hak Fei Poon: Innovator in Photovoltaic Technology

Introduction

Hak Fei Poon is an accomplished inventor based in Sunnyvale, California. He has made significant contributions to the field of photovoltaic devices, particularly through his innovative patent that enhances light transmission while reducing sheet resistance.

Latest Patents

Hak Fei Poon holds a patent for a "High light transmission, low sheet resistance layer for photovoltaic devices." This invention provides methods and devices for forming a low-resistance, high light transmission layer. The patent describes a method that includes creating a plurality of vias on a substrate, adding electrically conductive material into the vias, and solution depositing a nanowires infused window layer. The overall sheet resistance achieved is between about 1 to 10 ohms per square, with light transmission combined at least 70%, resulting in less than 5% shadow loss. This innovative approach may involve using a transparent conductive oxide layer beneath the window layer, eliminating opaque bus bars or fingers associated with traditional solar cells.

Career Highlights

Hak Fei Poon is currently associated with Aeris Capital Sustainable IP Ltd., where he continues to develop and refine his innovative ideas in sustainable technology. His work focuses on improving the efficiency and effectiveness of solar energy solutions.

Collaborations

Hak Fei Poon collaborates with Tianyue Yu, contributing to advancements in photovoltaic technology and sustainable energy solutions.

Conclusion

Hak Fei Poon's contributions to the field of photovoltaic devices exemplify the innovative spirit necessary for advancing sustainable energy technologies. His work not only enhances the efficiency of solar cells but also paves the way for future developments in renewable energy.