Incheon, South Korea

Hak Dong Cho

This inventor holds 1 USPTO granted patent. Top assignee: Dongguk University Industry-Academic Cooperation Foundation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hak Dong Cho. Retrieved from https://idiyas.com/inventor/hak-dong-cho-my5md54u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Hak Dong Cho: Innovator in Laser Diode Technology

Introduction

Hak Dong Cho is a prominent inventor based in Incheon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of laser diodes.

Latest Patents

Hak Dong Cho holds a patent for a "Laser diode using zinc oxide nanorods and manufacturing method thereof." This innovative patent describes a laser diode that incorporates zinc oxide nanorods, which enhances its performance. The design includes a wafer, an electrode layer formed on the wafer, a nanorod layer with multiple n-doped zinc oxide nanorods, and a p-doped single crystal semiconductor layer that is in physical contact with the ends of the zinc oxide nanorods. He has 1 patent to his name.

Career Highlights

Hak Dong Cho is affiliated with the Dongguk University Industry-Academic Cooperation Foundation, where he continues to advance research and development in his field. His work has garnered attention for its potential applications in various technologies.

Collaborations

He has collaborated with notable colleagues, including Sang Wuk Lee and Tae Won Kang, contributing to the advancement of innovative technologies in the semiconductor industry.

Conclusion

Hak Dong Cho's contributions to laser diode technology exemplify the impact of innovative research in the field of semiconductors. His work continues to inspire advancements in technology and applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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