Seoul, South Korea

Hak Dae Lee

This inventor holds 1 USPTO granted patent. Top assignee: C'est Image, Inc.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hak Dae Lee. Retrieved from https://idiyas.com/inventor/hak-dae-lee-7mt82l1j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Hak Dae Lee: Innovator in Image Sensing Technology

Introduction

Hak Dae Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of image sensing technology. His innovative work focuses on enhancing the capabilities of image sensors, particularly in varying lighting conditions.

Latest Patents

Hak Dae Lee holds a patent for an image sensing device that includes an image sensor with high dynamic range. This invention features a semiconductor substrate and a plurality of light-receiving elements. Additionally, light-shield films are formed on the upper ends of some light-receiving elements to partially block light. This design allows the image sensing device to accurately detect images in both bright and dark environments. He has 1 patent to his name.

Career Highlights

Hak Dae Lee is currently employed at C'est Image, Inc., where he continues to develop cutting-edge technologies in image sensing. His work has positioned him as a key figure in the advancement of imaging solutions.

Collaborations

Some of his notable coworkers include Seung Hyun Cha and Jin Heon Kim. Their collaborative efforts contribute to the innovative environment at C'est Image, Inc.

Conclusion

Hak Dae Lee's contributions to image sensing technology demonstrate his commitment to innovation and excellence. His work not only enhances image quality but also broadens the potential applications of image sensors in various fields.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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