Osaka, Japan

Hajime Tsuchiya

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nitto-Denko Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Tsuchiya. Retrieved from https://idiyas.com/inventor/hajime-tsuchiya-ws2m6xpq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hajime Tsuchiya: Innovator in Pressure-Sensitive Adhesives

Introduction

Hajime Tsuchiya is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of pressure-sensitive adhesives. His innovative work has led to the development of a patented method that enhances the performance of these adhesives.

Latest Patents

Hajime Tsuchiya holds a patent for a "Method for modification of surface of pressure-sensitive adhesive." This invention showcases his expertise and commitment to advancing adhesive technology. He has 1 patent to his name, reflecting his innovative contributions to the industry.

Career Highlights

Tsuchiya is currently employed at Nitto Denko Corporation, a leading company in the adhesive and materials sector. His role at the company allows him to apply his inventive skills and contribute to the development of cutting-edge adhesive solutions.

Collaborations

Throughout his career, Hajime Tsuchiya has collaborated with talented individuals such as Yasuhiro Umemoto and Toshiyasu Okui. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hajime Tsuchiya is a distinguished inventor whose work in pressure-sensitive adhesives has made a lasting impact on the industry. His patent and collaborations highlight his dedication to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…