Hiratsuka, Japan

Hajime Oyama

This inventor holds 2 USPTO granted patents. Top assignee: Mitsubishi Engineering-Plastics Corporation. Active years: 1998-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Oyama. Retrieved from https://idiyas.com/inventor/hajime-oyama-pp2nbc97

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1998-2001

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2 patents (USPTO):Explore Patents

Title: Hajime Oyama: Innovator in Polyamide Resin Technology

Introduction

Hajime Oyama is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of polyamide resin technology, holding a total of 2 patents. His work focuses on innovative applications of polyamide resins, which are crucial in various industrial processes.

Latest Patents

Oyama's latest patents include "Integrally molded articles of polyamide resins" and "Vibration welded hollow moldings of polyamide resin composition." The latter invention relates to a vibration-molded hollow product that comprises a polyamide resin composition, showcasing his expertise in advanced material applications.

Career Highlights

Hajime Oyama is associated with Mitsubishi Engineering-Plastics Corporation, where he has been instrumental in developing new technologies that enhance the performance and utility of polyamide resins. His innovative approaches have positioned him as a key figure in the industry.

Collaborations

Oyama has collaborated with notable colleagues such as Hiroshi Urabe and Tatsuya Hitomi. Their combined efforts have contributed to advancements in the field, fostering a collaborative environment that encourages innovation.

Conclusion

Hajime Oyama's work in polyamide resin technology exemplifies the impact of innovation in material science. His patents and collaborations reflect a commitment to advancing industrial applications, making him a significant contributor to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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