Company Filing History:
Years Active: 2011-2017
Title: Hajime Onoda: Innovator in Semiconductor Cleaning Technology
Introduction
Hajime Onoda is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of cleaning methods for semiconductor substrates. With a total of 3 patents to his name, Onoda's work has had a considerable impact on the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Onoda's latest patents focus on advanced apparatuses and methods for cleaning semiconductor substrates. One of his notable inventions is a cleaning apparatus that includes a belt conveyor and a treatment head designed to execute cleaning, rinsing, and drying treatments. This innovative cleaning apparatus features a rinse water supplying mechanism that adjusts the pH value of the rinse water and heats it to a temperature of 70°C or above. The treatment head is equipped with an optical mechanism that recognizes patterns on the semiconductor substrate, ensuring that the substrate is automatically placed on the belt conveyor in the correct orientation. Additionally, the treatment head includes a drying treatment mechanism that utilizes both drying solvent and lamp annealing for effective drying.
Another significant patent by Onoda describes a semiconductor substrate cleaning method that involves cleaning a substrate with a line-and-space pattern, followed by rinsing and drying. This method includes the mixing of deionized water and hydrochloric acid to create a rinse water mixture with a predetermined pH value and temperature, enhancing the cleaning process.
Career Highlights
Throughout his career, Hajime Onoda has worked with prominent companies in the technology sector. He has been associated with Kabushiki Kaisha Toshiba and Toshiba Memory Corporation, where he has contributed to various innovative projects and advancements in semiconductor technology.
Collaborations
Onoda has collaborated with several talented individuals in his field, including Yoshihiro Ogawa and Hiroshi Kawamoto. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in semiconductor cleaning.
Conclusion
Hajime Onoda's contributions to semiconductor cleaning technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing processes.