Location History:
- Ushiku, JP (2002)
- Tokyo, JP (1981 - 2006)
Company Filing History:
Years Active: 1981-2006
Title: Hajime Onoda: Innovator in Gas Measurement and Drying Technologies
Introduction
Hajime Onoda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of gas measurement and drying technologies. With a total of 7 patents to his name, Onoda's work reflects a commitment to innovation and practical solutions.
Latest Patents
One of Onoda's latest patents is the diaphragm gas meter. This invention features a measuring diaphragm within a measuring chamber that reciprocates according to the gas pressure from the inflow port. The diaphragm's movement is interlinked with a valve mechanism and an integrating mechanism through a wing shaft and crank mechanism. Notably, the diaphragm is designed in an elliptical shape, which enhances its functionality in gas measurement.
Another significant patent is the drying apparatus and drying method. This apparatus includes a drying vessel, a treatment liquid feeder-discharger for pure water, and a vapor supplier for organic solvent vapor. The design allows for the formation of an organic solvent film on the liquid level of pure water, which adheres to the surface of wafers during the drying process. This innovative approach ensures effective drying while maintaining the integrity of the wafers.
Career Highlights
Throughout his career, Hajime Onoda has worked with notable companies such as Kimmon Manufacturing Co., Ltd. and Kimmon Quartz Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies.
Collaborations
Onoda has collaborated with several professionals in his field, including Tetsuya Tarui and Hiromitsu Asano. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Hajime Onoda's contributions to gas measurement and drying technologies highlight his role as a leading inventor in Japan. His innovative patents and collaborations reflect a dedication to advancing technology in practical and impactful ways.