Kyoto, Japan

Hajime Oiwa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kyulux, Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Oiwa. Retrieved from https://idiyas.com/inventor/hajime-oiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Hajime Oiwa - Innovator in Light Emitting Materials

Introduction

Hajime Oiwa is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of organic light emitting devices. His innovative work has led to the development of a unique compound that serves as a light emitting material.

Latest Patents

Hajime Oiwa holds a patent for a compound, light emitting material, and organic light emitting device. The compound is represented by a specific general formula, which is useful as a light emitting material. The formula includes an arylene group and aryl groups, with substituents that may include a diarylamino group. He has 1 patent to his name.

Career Highlights

Oiwa is currently associated with Kyulux, Inc., where he continues to advance his research and development in the field of light emitting technologies. His work has been instrumental in enhancing the efficiency and performance of organic light emitting devices.

Collaborations

Hajime Oiwa collaborates with notable colleagues, including Atsushi Wakamiya and Furitsu Suzuki. Their combined expertise contributes to the innovative projects at Kyulux, Inc.

Conclusion

Hajime Oiwa is a key figure in the development of light emitting materials, with a focus on organic light emitting devices. His contributions are paving the way for advancements in this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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