Yuki, Japan

Hajime Nakamura

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Nakamura. Retrieved from https://idiyas.com/inventor/hajime-nakamura-mx2a594d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hajime Nakamura

Introduction

Hajime Nakamura is a notable inventor based in Yuki, Japan. He has made significant contributions to the field of electromagnetic shielding technology. His work is particularly recognized for its practical applications in various electronic devices.

Latest Patents

Nakamura holds a patent for an electromagnetic shield film, which is designed to protect electronic devices from electromagnetic interference. This innovative film comprises a transparent base, a conductor positioned on the base via an adhesive, and a mesh geometric pattern. Additionally, it features an earth portion arranged around the conductor, which includes conductive regions that absorb electromagnetic waves and non-conductive regions that prevent creasing.

Career Highlights

Hajime Nakamura is associated with Hitachi Chemical Company, Ltd., where he has been instrumental in developing advanced materials for electronic applications. His expertise in electromagnetic shielding has positioned him as a key figure in the industry.

Collaborations

Nakamura has worked alongside talented colleagues such as Hiroaki Takahashi and Junichi Imaizumi. Their collaborative efforts have further enhanced the innovative capabilities of their projects.

Conclusion

Hajime Nakamura's contributions to electromagnetic shielding technology exemplify the importance of innovation in the electronics industry. His patent and collaborative work continue to influence advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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