Kawasaki, Japan

Hajime Aoyama


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations in Lithography: The Contributions of Hajime Aoyama

Introduction

Hajime Aoyama is an inventor based in Kawasaki, Japan, known for his innovative contributions to the field of lithography. His work primarily focuses on enhancing the precision and accuracy of pattern sizing, which is critical in the manufacturing of semiconductor devices.

Latest Patents

One of Aoyama's notable inventions is a "Pattern Size Correcting Device and Pattern Size Correcting Method." This patent consists of a sophisticated device that includes several key components. It utilizes a testing photomask with a test pattern to quantify size variation as a function of distance, taking into account the open area ratio. The device comprises an open area ratio calculating unit that divides the exposure area into correction areas, calculating the open area ratios of these sections. Additionally, it features a data correcting unit that inputs the calculated open area ratios to adjust the design data of actual device patterns. Furthermore, it includes a proximity effect correcting unit to address proximity effects. This innovative device allows for quantitative estimation of size variations that occur during lithography, facilitating precise and efficient pattern size corrections.

Career Highlights

Hajime Aoyama is employed by Fujitsu Corporation, where he contributes to the company's advancements in technology and manufacturing processes. His work directly impacts the semiconductor industry, allowing for enhanced production efficiency and device performance.

Collaborations

Aoyama collaborates with talented colleagues, including Morimi Osawa and Teruyoshi Yao. Together, they work on various projects aimed at improving lithography techniques and developing new technologies for the semiconductor industry.

Conclusion

Hajime Aoyama's contributions to the field of lithography exemplify the importance of innovation in the semiconductor industry. Through his patented works and collaboration with skilled professionals, he continues to pave the way for advancements that enhance manufacturing precision and efficiency. His efforts underscore the vital role of inventors in driving technological progress.

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