This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Sabic Global Technologies B.v.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Innovations of Haiying Wang in Infrared Radiation Absorption
Introduction
Haiying Wang is a notable inventor based in Shanghai, China. She has made significant contributions to the field of materials science, particularly in the development of infrared radiation absorbing technologies. Her innovative work has led to the creation of a patented method that enhances the efficiency of infrared radiation absorption.
Latest Patents
Haiying Wang holds a patent for "Infrared radiation absorbing articles and method of manufacture." This patent describes a method for creating an infrared radiation absorbing coating mixture. The process involves forming an ITO coating mixture that is free of colloidal silica and includes a first coating matrix made from the partial condensate of a silanol. Additionally, a colloidal silica coating mixture is created, which also incorporates a second coating matrix made from a silanol partial condensate. The combined mixture produced from these components does not exhibit any visible precipitate after two weeks without stirring, showcasing its stability and effectiveness.
Career Highlights
Wang is currently associated with Sabic Global Technologies B.V., where she continues to advance her research and development efforts. Her work has not only contributed to her personal achievements but has also enhanced the technological capabilities of her organization.
Collaborations
Throughout her career, Haiying Wang has collaborated with esteemed colleagues, including Liping Zheng and Steven Marc Gasworth. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Haiying Wang's contributions to infrared radiation absorption technology exemplify her dedication to innovation in materials science. Her patented methods and collaborative efforts continue to influence the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
