Suzhou, China

Haiyang He

This inventor holds 1 USPTO granted patent. Top assignee: Huawei Technologies Co., Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haiyang He. Retrieved from https://idiyas.com/inventor/haiyang-he-ng4xobcx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Haiyang He in Obstacle Recognition Technology

Introduction

Haiyang He is a notable inventor based in Suzhou, China. He has made significant contributions to the field of obstacle recognition technology. His innovative approach has led to the development of a unique method and device that enhances the efficiency of obstacle detection.

Latest Patents

Haiyang He holds a patent for an "Obstacle recognition method and related device." This invention involves a sophisticated method that includes obtaining an actual path loss value between a first access point (AP) and a second AP. It also involves analyzing path loss value pairs between a terminal and multiple AP pairs. The method aims to determine the presence of obstacles between the two APs by comparing path loss values.

Career Highlights

He is currently employed at Huawei Technologies Co., Limited, where he continues to work on innovative solutions in technology. His expertise in obstacle recognition has positioned him as a valuable asset in his field. With a focus on practical applications, he strives to improve communication systems through his inventions.

Collaborations

Haiyang He collaborates with talented colleagues, including Xiaofei Bai and Jun Zhan. Their combined efforts contribute to the advancement of technology at Huawei.

Conclusion

Haiyang He's work in obstacle recognition technology exemplifies the impact of innovation in enhancing communication systems. His contributions are paving the way for future advancements in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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