Shanghai, China

Haimin Luo

This inventor holds 1 USPTO granted patent. Top assignee: Shanghaitech University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haimin Luo. Retrieved from https://idiyas.com/inventor/haimin-luo-qgh9a8n6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Haimin Luo: Innovator in Hair Rendering Technology

Introduction

Haimin Luo is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of computer graphics, particularly in hair rendering technology. His innovative approach utilizes deep neural networks to enhance the realism of furry object rendering.

Latest Patents

Haimin Luo holds a patent for a "Hair rendering system based on deep neural network." This system models the high-frequency components of furry objects, allowing for the generation of photo-realistic rendering results. Compared to existing methods, his approach offers superior quality and detail. An acceleration method is integrated into the framework, which speeds up both training and rendering processes. Additionally, a patch-based training scheme is introduced, significantly improving output quality while preserving high-frequency details.

Career Highlights

Haimin Luo is affiliated with ShanghaiTech University, where he continues to advance his research and development in computer graphics. His work has garnered attention for its innovative use of deep learning techniques in rendering applications.

Collaborations

Haimin has collaborated with notable colleagues, including Minye Wu and Lan Xu, who share his passion for advancing technology in the field of computer graphics.

Conclusion

Haimin Luo's contributions to hair rendering technology exemplify the intersection of innovation and practical application in computer graphics. His work not only enhances visual realism but also pushes the boundaries of what is possible in rendering technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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