Company Filing History:
Years Active: 2011-2012
Title: Hailong Zhou: Innovator in Zinc Oxide Film Growth
Introduction
Hailong Zhou is a prominent inventor based in Singapore, known for his contributions to the field of materials science. He has been awarded two patents, showcasing his innovative approach to developing high-quality zinc oxide films.
Latest Patents
One of Hailong Zhou's latest patents is a method for growing zinc oxide film on an epitaxial lateral overgrowth gallium nitride template. This growth method involves several key steps: first, a gallium nitride layer is grown on a sapphire substrate at approximately 1000°C. Next, a SiO mask is patterned into stripes oriented in the gallium nitride <100> or <110> direction. The process continues with the epitaxial lateral overgrowth of gallium nitride layers, where facet planes are controlled by selecting the appropriate growth temperature and reactor. Finally, zinc oxide films are deposited on the facets of the ELO gallium nitride templates using chemical vapor deposition (CVD). This innovative method allows for the growth of high-quality zinc oxide crystals with a reduced number of crystal defects, making it suitable for future electronic and optoelectronic devices.
Career Highlights
Hailong Zhou is affiliated with the National University of Singapore, where he conducts research and development in materials science. His work has significantly advanced the understanding and application of zinc oxide films in various technological fields.
Collaborations
Some of Hailong Zhou's notable coworkers include Jianyi Lin and Hui Pan, who contribute to his research endeavors and collaborative projects.
Conclusion
Hailong Zhou's innovative methods in zinc oxide film growth highlight his significant contributions to materials science. His work not only enhances the quality of zinc oxide films but also paves the way for advancements in electronic and optoelectronic applications.