Beijing, China

Hailong Gao

This inventor holds 1 USPTO granted patent. Top assignees: Beijing Boe Display Technology Co., Ltd., Boe Technology Group Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hailong Gao. Retrieved from https://idiyas.com/inventor/hailong-gao-t2aifa3g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

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Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Hailong Gao: Innovator in Detaching Tools

Introduction

Hailong Gao is a notable inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly with his innovative detaching tool. His work has garnered attention for its practical applications in the electronics industry.

Latest Patents

Hailong Gao holds a patent for a detaching tool designed to facilitate the separation of printed circuit boards from backlight source back plates. The detaching tool includes a detaching plate, which is specifically adapted to be inserted between the printed circuit board and the backlight source back plate. This invention is crucial for efficiently detaching the PCBA that is adhered to the backlight source back plate.

Career Highlights

Throughout his career, Hailong Gao has worked with prominent companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Beijing BOE Display Technology Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions.

Collaborations

Hailong Gao has collaborated with several professionals in his field, including Lizhao Hou and Ji Min Zhang. These collaborations have likely enhanced his work and contributed to the development of his inventions.

Conclusion

Hailong Gao is a distinguished inventor whose work on detaching tools has made a significant impact in the technology industry. His innovative approach and collaborations with industry professionals highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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