Hangzhou, China

Haijun Gu

This inventor holds 1 USPTO granted patent. Top assignee: Hangzhou Meari Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haijun Gu. Retrieved from https://idiyas.com/inventor/haijun-gu-6bsq5k9z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Haijun Gu and False-Report Elimination Technology.

Introduction

Haijun Gu is an inventor based in Hangzhou, China. His work includes a patent for a method designed to identify and eliminate false-positive reports about target objects.

Latest Patents

Gu is associated with 1 patent, titled “Method, Device, Equipment and Medium for False-Report Elimination.” The invention analyzes a target object to obtain an encryption feature and current position information, then compares current image information with locally stored historical images. If the images differ, the system checks whether the target object is detectable in the current image. When it is, the encryption feature is sent to a cloud service, which determines the object’s actual position. The system then verifies the object using that position and, if verification passes, identifies it as a false-positive object and performs an elimination operation.

Career Highlights

Gu is associated with Hangzhou Meari Technology Co., Ltd. His patented work describes a process combining image comparison, position information, and cloud-based verification to address false reports.

Collaborations

The provided information lists Shiquan Yu and Gangqiang Zhao as Gu’s coworkers. Their specific roles in the patent or their professional relationship to this invention are not specified.

Conclusion

Haijun Gu’s patent presents a verification-based approach to eliminating false-positive reports by combining image analysis, location data, and cloud processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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