This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Jiao Tong University. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Innovations of Haihua Tao in Graphene Film Patterning
Introduction
Haihua Tao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative methods have the potential to advance various applications in electronics and nanotechnology.
Latest Patents
Haihua Tao holds a patent titled "Method for implementing and regulating patterning of a graphene film by ultraviolet photo-oxidation." This patent describes a method that includes several key steps. First, it implements patterning of a graphene film micron structure pattern using a xenon lamp excimer ultraviolet photo-oxidation vacuum apparatus and a hard mask. Second, it controls oxygen excitons by applying a non-uniform magnetic field on the surface of the graphene film in a vertical direction. This approach enhances the directivity of etching to the graphene film, thereby improving the patterning quality. Lastly, by adjusting the intensity and direction of the magnetic field, the movement of the oxygen excitons is controlled, allowing for precise shaping of the etched pattern structure of the graphene film.
Career Highlights
Haihua Tao is affiliated with Shanghai Jiao Tong University, where he conducts research and develops innovative technologies. His work focuses on enhancing the quality and efficiency of graphene film patterning, which is crucial for various technological advancements.
Collaborations
Some of his notable coworkers include Xianfeng Chen and Yixuan Wu. Their collaborative efforts contribute to the ongoing research and development in the field of graphene technology.
Conclusion
Haihua Tao's innovative methods in graphene film patterning represent a significant advancement in materials science. His contributions have the potential to influence various applications in technology and research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
