Qingdao, China

Haifeng Lu


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Haifeng Lu - Innovator in High-Temperature Resistant Coatings

Introduction

Haifeng Lu is a notable inventor based in Qingdao, China. He has made significant contributions to the field of materials science, particularly in the development of advanced coatings. His innovative work focuses on creating solutions that enhance the durability and performance of materials under extreme conditions.

Latest Patents

Haifeng Lu holds a patent for a high-temperature resistant, peelable, and anti-corrosion coating. The patent describes a preparation method and application for this coating, which includes two components: component A and component B. Component A consists of a film-forming substance, pigment, filler, an adhesion modifier, an auxiliary agent, and a solvent. Component B includes a vulcanizing agent and a solvent. The formulation allows the coating to be completely peeled off from the substrate after exposure to high temperatures of 200° C for four hours, without damaging the substrate itself. This innovation is particularly valuable in industries where materials are subjected to harsh environments.

Career Highlights

Haifeng Lu is associated with the Marine Chemical Research Institute Co., Ltd., where he continues to advance his research and development efforts. His work has garnered attention for its practical applications and potential to improve material performance in various sectors.

Collaborations

Haifeng Lu collaborates with talented individuals in his field, including Lianfeng Wu and Gong Cheng. Their combined expertise contributes to the innovative projects at the Marine Chemical Research Institute.

Conclusion

Haifeng Lu's contributions to the field of high-temperature resistant coatings exemplify the importance of innovation in material science. His patented technology not only enhances the performance of coatings but also opens new avenues for applications in challenging environments.

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