Gaithersburg, MD, United States of America

Haidong Wang

This inventor holds 1 USPTO granted patent. Top assignee: Thales Defense & Security, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haidong Wang. Retrieved from https://idiyas.com/inventor/haidong-wang-k4e5f857

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Haidong Wang: Innovator in Multichannel Connector Technology

Introduction

Haidong Wang is a notable inventor based in Gaithersburg, MD (US). He has made significant contributions to the field of connector technology, particularly with his innovative designs that enhance compatibility and functionality.

Latest Patents

Haidong Wang holds a patent for a "Backward compatible multichannel connector." This invention features a housing designed to accommodate multiple contact pins. The housing includes various contact pin locations, with designated sets for different channels. The first set of contact pins is configured to carry a signal associated with the first channel, while the second set is designed for a second channel. This innovative design allows for seamless communication between devices.

Career Highlights

Haidong Wang is currently employed at Thales Defense & Security, Inc., where he continues to develop cutting-edge technologies. His work focuses on creating solutions that meet the evolving needs of the defense and security sectors.

Collaborations

Haidong has collaborated with notable colleagues, including Douglas Bell and Steven Kutchi. These partnerships have fostered an environment of innovation and creativity, leading to advancements in connector technology.

Conclusion

Haidong Wang's contributions to multichannel connector technology exemplify his commitment to innovation. His work not only enhances device compatibility but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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