Beijing, China

Hai Ning Zhang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Vmware, Inc.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hai Ning Zhang - Innovator in Machine Learning Compilation

Introduction

Hai Ning Zhang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of machine learning, particularly in the area of model compilation. His innovative approach has garnered attention in the tech community, showcasing his expertise and dedication to advancing technology.

Latest Patents

Hai Ning Zhang holds a patent titled "Registry enhancements for just-in-time compilation of machine learning models." This patent presents a method for dynamic centralized model compilation. The disclosure outlines a process that includes receiving a request for a machine learning model from a client. The request specifies various attributes, such as hardware characteristics, target precision, or compiler characteristics. The invention determines the appropriate compiler based on these attributes or default behaviors, compiles the model, and provides the compiled model back to the client.

Career Highlights

Currently, Hai Ning Zhang is employed at VMware, Inc., where he continues to work on innovative solutions in the realm of machine learning. His role at VMware allows him to collaborate with other talented professionals and contribute to cutting-edge projects that push the boundaries of technology.

Collaborations

One of his notable coworkers is Jia Zou, with whom he collaborates on various projects. Their combined expertise enhances the development of advanced machine learning solutions.

Conclusion

Hai Ning Zhang is a key figure in the field of machine learning, with a focus on improving model compilation processes. His patent and work at VMware, Inc. reflect his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
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