Hai Jiang Peng

Title: **Innovative Contributions of Hai Jiang Peng in Semiconductor Manufacturing**

Introduction

Hai Jiang Peng is a notable inventor based in Singapore, renowned for his significant contribution to semiconductor manufacturing through his innovative patent. With a singular patent to his name, Peng has demonstrated his expertise in advancing technology within the industry.

Latest Patents

Hai Jiang Peng holds a patent entitled "Method of cobalt silicidation using an oxide-Titanium interlayer." This groundbreaking method presents a new approach for forming a high-quality cobalt disilicide film, which is essential in the fabrication of integrated circuits. The process involves several key steps, including the growth of a thermal oxide layer over a semiconductor substrate, followed by the deposition of a titanium layer, a cobalt layer, and a titanium nitride capping layer. The substrate is then subjected to rapid thermal annealing, transforming cobalt into cobalt monosilicide and ultimately into cobalt disilicide, completing the formation necessary for integrated circuit manufacturing.

Career Highlights

Hai Jiang Peng's career is marked by his significant role at Chartered Semiconductor Manufacturing Ltd, a leading corporation in the semiconductor industry. His work focuses on enhancing manufacturing processes and contributing to advancements in silicon technology, directly impacting the efficiency and quality of integrated circuits.

Collaborations

Throughout his career, Peng has collaborated with notable peers in the industry, including colleagues Chung Woh Lai and Beichao Zhang. These collaborative efforts highlight the importance of teamwork in the field of semiconductor research and development, leading to innovative solutions and patents that drive the industry forward.

Conclusion

In conclusion, Hai Jiang Peng’s contributions to semiconductor manufacturing through his innovative patent are invaluable. His method of cobalt silicidation exemplifies the kind of advancements that continue to shape the future of integrated circuit technology. As an inventor, Peng's work not only showcases his individual talent but also reflects the collaborative nature of innovation in the technology sector.