Chu-Nan, Taiwan

Hai-Hung Wen

This inventor holds 1 USPTO granted patent. Top assignee: Altus Technology Inc.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hai-Hung Wen. Retrieved from https://idiyas.com/inventor/hai-hung-wen-sg2hpk91

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hai-Hung Wen

Introduction

Hai-Hung Wen is a notable inventor based in Chu-Nan, Taiwan. He has made significant contributions to the field of camera technology, particularly in lens auto-focusing methods. His work has implications for improving the efficiency and accuracy of camera module testing.

Latest Patents

Wen holds a patent for a "Method and apparatus for lens auto-focusing in camera module test." This innovative method involves several steps, including the use of testing equipment such as a range finder, a signal processor, and a driving member. The process also includes providing an imaged object and a camera module that consists of a lens module and an image sensor. The method ensures that the image formed by the lens module is accurately focused by calculating the necessary displacement for the driving member.

Career Highlights

Wen is currently employed at Altus Technology Inc., where he continues to develop and refine technologies related to camera modules. His expertise in lens auto-focusing has positioned him as a valuable asset in the field of optical engineering.

Collaborations

Wen has collaborated with talented coworkers, including Yu Tai and Chien-I Chen. Their combined efforts contribute to the advancement of technology in their respective areas of expertise.

Conclusion

Hai-Hung Wen's innovative work in lens auto-focusing technology showcases his dedication to improving camera module testing. His contributions are significant in the realm of optical engineering and continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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