This inventor holds 1 USPTO granted patent. Top assignee: The University of Texas System. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Hafez Hemmati: Innovator in Metasurface Fabrication
Introduction
Hafez Hemmati is a notable inventor based in Arlington, TX (US). He has made significant contributions to the field of metasurface technology, particularly in the area of fabrication methods. His innovative approach has the potential to advance various applications in optics and materials science.
Latest Patents
Hafez Hemmati holds a patent titled "Rapid large-scale fabrication of metasurfaces with complex unit cells." This patent describes a method of fabricating a metasurface that involves coating a photoresist film onto a substrate. The process includes loading the coated substrate into a laser interference lithography setup, exposing the photoresist film via a laser with a first interference pattern, and subsequently exposing it with a second interference pattern. The method culminates in developing the exposed portions of the photoresist film to form a periodic pattern, which is then transferred into the substrate, supporting an appropriate film system that embodies the final metasurface device. He has 1 patent to his name.
Career Highlights
Hafez Hemmati is affiliated with the University of Texas System, where he continues to engage in research and development in the field of metasurfaces. His work is characterized by a commitment to advancing technology through innovative fabrication techniques.
Collaborations
Hafez has collaborated with esteemed colleagues such as Robert Magnusson and Kyu Nam Lee. Their combined expertise contributes to the advancement of research in metasurface technology.
Conclusion
Hafez Hemmati is a pioneering inventor whose work in the fabrication of metasurfaces is paving the way for future innovations in the field. His contributions are significant and reflect a dedication to advancing technology through research and collaboration.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
