Yongin, South Korea

Haekwang Lee

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Amorepacific Corporation, Massachusetts Institute of Technology. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haekwang Lee. Retrieved from https://idiyas.com/inventor/haekwang-lee-lmmrblql

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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2 patents (USPTO):Explore Patents

Title: Haekwang Lee: Innovator in Sensor Technology

Introduction

Haekwang Lee is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of sensor technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

His latest patents include a strain sensor unit and a skin sensor module comprising the same. The strain sensor unit features a substrate with a through-hole, incorporating a first electrode and a second electrode positioned on either side of the through-hole. A piezoelectric device extends inward from the first electrode, while a piezoresistor extends from the second electrode, overlapping with the piezoelectric device. This design enhances the functionality and application of strain sensors in various technologies.

Career Highlights

Haekwang Lee has worked with prominent organizations, including Amorepacific Corporation and the Massachusetts Institute of Technology. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking projects in sensor technology.

Collaborations

Some of his notable coworkers include Jiyeon Han and Eunjoo Kim, who have collaborated with him on various projects, further enriching his innovative endeavors.

Conclusion

Haekwang Lee's work in developing advanced sensor technologies demonstrates his commitment to innovation and engineering excellence. His contributions continue to influence the field and inspire future advancements in sensor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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