Shenzhen, China

Hae Won Kim

This inventor holds 1 USPTO granted patent. Top assignee: Hkc Corporation Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hae Won Kim. Retrieved from https://idiyas.com/inventor/hae-won-kim-i6ny7vn9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hae Won Kim: Innovator in Display Technology

Introduction

Hae Won Kim is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of display technology, particularly through his innovative patent work. His expertise and creativity have positioned him as a valuable asset in the industry.

Latest Patents

Hae Won Kim holds a patent for an "Array substrate, display panel and method for repairing bad spots on the panel." This invention discloses an array substrate that includes a substrate with multiple data lines and scan lines. These lines are insulated and intersected to define sub-pixel areas, each containing a sub-pixel with pixel electrodes that form light-emitting areas. The design allows for efficient electrical connections and enhances the functionality of display panels.

Career Highlights

Hae Won Kim is currently associated with Hkc Corporation Limited, where he continues to innovate and develop new technologies. His work has led to advancements in display panel design and repair methods, showcasing his commitment to improving visual technology.

Collaborations

Throughout his career, Hae Won Kim has collaborated with talented individuals such as Won Kyu Lee and Seung Kyu Choi. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hae Won Kim's contributions to display technology through his patent work and collaborations highlight his role as a leading inventor in the field. His innovative spirit continues to drive advancements in technology, making a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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