Seoul, South Korea

Hae Ree Na

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hae Ree Na. Retrieved from https://idiyas.com/inventor/hae-ree-na-pdozklbm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Hae Ree Na: Innovator in Display Technology

Introduction

Hae Ree Na is a prominent inventor based in Seoul, South Korea. He is known for his contributions to display technology, particularly in the realm of graphical user interfaces. His innovative work has garnered attention in the tech industry, especially through his association with a leading company.

Latest Patents

Hae Ree Na holds a patent for a "Display screen or portion thereof with graphical user interface." This patent showcases his expertise in creating advanced display technologies that enhance user interaction and experience.

Career Highlights

Hae Ree Na is currently employed at Samsung Electronics Co., Ltd., a global leader in technology and electronics. His role at Samsung has allowed him to work on cutting-edge projects that push the boundaries of display technology. With 1 patent to his name, he has made a significant impact in his field.

Collaborations

Throughout his career, Hae Ree Na has collaborated with talented individuals such as Eunhye Jee and Hyunwoo Choi. These collaborations have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Hae Ree Na is a key figure in the field of display technology, with a focus on enhancing graphical user interfaces. His work at Samsung Electronics Co., Ltd. and his innovative patent reflect his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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