Munich, Germany

Habib Ur Rehman Paracha

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Arriver Software Ab. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Habib Ur Rehman Paracha. Retrieved from https://idiyas.com/inventor/habib-ur-rehman-paracha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of Habib Ur Rehman Paracha

Introduction

Habib Ur Rehman Paracha is a notable inventor based in Munich, Germany. He has made significant contributions to the field of vehicle radar systems, showcasing his expertise through innovative patents.

Latest Patents

One of his key patents is titled "Determining object motion and acceleration vector in a vehicle radar system." This invention involves a vehicle radar system that provides measured azimuth angles and radial velocities for multiple detections. The system selects detections for velocity and acceleration components, calculates these components, and determines errors between calculated and measured radial velocities. The set of components that results in the largest number of inliers is then chosen, enhancing the accuracy of the radar system.

Career Highlights

Habib Ur Rehman Paracha is currently employed at Arriver Software AB, where he continues to develop innovative solutions in the automotive technology sector. His work focuses on improving vehicle safety and performance through advanced radar systems.

Collaborations

He collaborates with Martin Hofmann, a fellow professional in the field, to further enhance the capabilities of their projects.

Conclusion

Habib Ur Rehman Paracha's contributions to vehicle radar technology exemplify his innovative spirit and dedication to advancing automotive safety. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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