Seoul, South Korea

Ha Won Yoon

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samoo Architects & Engineers. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ha Won Yoon. Retrieved from https://idiyas.com/inventor/ha-won-yoon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ha Won Yoon and a Modular Approach to Building Envelopes.

Introduction

Ha Won Yoon is an inventor based in Seoul, South Korea, associated with Samoo Architects & Engineers. Her patent describes a way to change a building’s exterior envelope while preserving usable interior space and adapting the building to users’ needs.

Latest Patents

Yoon is named on 1 patent: “Method for Changing Building Envelope Function.” The invention proposes separating a target exterior enclosure from a building, sliding it outward along a guide frame like a drawer, replacing its internal cartridge with one that provides a different function, and sliding the enclosure back into place. This modular process is intended to make envelope modifications easier without reducing the building’s usable interior area.

Career Highlights

Yoon’s listed work at Samoo Architects & Engineers connects her invention to architectural design and building systems. The patent focuses on adaptability, allowing an exterior enclosure’s function to be changed by replacing a cartridge rather than altering the building’s interior.

Collaborations

The supplied information lists Jun Yub Kim and Sang Eun Han as Yoon’s coworkers. Their specific roles in the patent or related work are not provided.

Conclusion

Ha Won Yoon’s patented method presents a drawer-like, replaceable approach to modifying building envelopes while retaining interior space.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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