Ha-Min Hwang

Title: Ha-Min Hwang: Innovator in Semiconductor Technology

Introduction

Ha-Min Hwang is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Hwang's latest patents include advancements in semiconductor memory devices and electronic systems. One of his notable inventions is a semiconductor memory device that features a first substrate with distinct regions. This device incorporates a stacked structure that includes word lines and an interlayer insulating film. Additionally, it features a dummy conductive structure that extends through the stacked structure to contact the first substrate. The design ensures that the height of the dummy conductive structure is greater than that of the plate contact plug, enhancing the device's functionality.

Career Highlights

Ha-Min Hwang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to the development of cutting-edge electronic systems.

Collaborations

Hwang has collaborated with notable coworkers, including Jong Soo Kim and Ju-Young Lim. Their teamwork has fostered an environment of creativity and innovation, leading to the successful development of advanced semiconductor technologies.

Conclusion

Ha-Min Hwang's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His inventions continue to influence the development of electronic systems, showcasing the importance of innovation in technology.