Location History:
- Towanda, PA (US) (1990)
- Baltimore, MD (US) (1992)
- Los Angeles, CA (US) (1995)
Company Filing History:
Years Active: 1990-1995
Title: Ha K Cheung: Innovator in X-ray Phosphor Technology
Introduction
Ha K Cheung is a notable inventor based in Baltimore, MD (US), recognized for his contributions to the field of x-ray phosphor technology. With a total of 3 patents, Cheung has made significant advancements that enhance the performance of x-ray phosphors.
Latest Patents
Cheung's latest patents include a method of making niobium-activated yttrium tantalate x-ray phosphor. This innovation focuses on increasing the brightness and particle size of the phosphor through the addition of either barium fluorosilicate or calcium fluorosilicate. Another notable patent is for an unactivated yttrium tantalate phosphor, which incorporates additives such as Sr, Rb, and Al to improve brightness under X-radiation.
Career Highlights
Throughout his career, Cheung has worked with prominent companies, including GTE Products Corporation and Osram Sylvania Inc. His work in these organizations has contributed to the development of advanced materials and technologies in the field of x-ray imaging.
Collaborations
Cheung has collaborated with various professionals in his field, including his coworker Vaddi B Reddy, who has also made significant contributions to x-ray phosphor technology.
Conclusion
Ha K Cheung's innovative work in x-ray phosphor technology has led to important advancements in the field. His patents reflect a commitment to enhancing the performance of materials used in x-ray imaging applications.