This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Ha-chul Shin: Graphene Structure and Device Innovation.
Introduction
Ha-chul Shin is an inventor based in Suwon, South Korea, whose patent work concerns graphene structures and devices. His disclosed invention describes a method for forming graphene on a silicon carbide substrate.
Latest Patents
The provided information lists one patent for Shin: “Graphene structure, graphene device including same, and method of manufacturing graphene structure.” The method involves depositing a metal layer over a silicon carbide substrate and heat-treating the coated substrate at a first temperature. This process forms a composite layer containing metal and a graphene layer on the substrate. The resulting structure is intended for use in a graphene device. Shin’s listed portfolio includes 1 patent.
Career Highlights
Shin is associated with Samsung Electronics Co., Ltd. His patent reflects work on graphene fabrication and the integration of graphene structures into electronic devices.
Collaborations
The provided information names In-kyung Song and Joung-real Ahn as Shin’s coworkers. Their inclusion indicates professional connections, though no specific roles in the listed patent are provided.
Conclusion
Ha-chul Shin’s listed patent focuses on a metal-assisted process for forming graphene on silicon carbide, connecting materials fabrication with potential electronic-device applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile