H Joseph Hoehn

Title: H Joseph Hoehn: Innovator in Gas Discharge Technology

Introduction

H Joseph Hoehn is a notable inventor based in Toledo, OH (US). He has made significant contributions to the field of gas discharge devices, particularly through his innovative patent related to phosphor overcoats. His work has implications for various applications, including display and memory technologies.

Latest Patents

H Joseph Hoehn holds a patent for a gas discharge device that features electrode arrays and an ionizable gaseous medium. The invention includes a phosphor that is excited by radiation from the gas discharge, with the life of the phosphor being enhanced by a phosphor overcoat. This overcoat is designed to be at least partially transmissive to the excitation radiation, which is crucial for the device's performance. The phosphor overcoat is typically made from alkali and alkaline earth fluorides. In one embodiment, the gaseous medium consists of rare gases such as neon, argon, xenon, and krypton. The device is particularly suited for display and memory applications, where electrical charges are stored on opposing dielectric surfaces.

Career Highlights

H Joseph Hoehn is associated with Owens-Illinois, Inc., where he has contributed to advancements in gas discharge technology. His work has been instrumental in enhancing the efficiency and longevity of phosphors used in various devices.

Collaborations

Some of his notable coworkers include David C Hinson and Wolfgang W Bode, who have collaborated with him on various projects related to gas discharge devices.

Conclusion

H Joseph Hoehn's innovative work in gas discharge technology, particularly his patent on phosphor overcoats, showcases his significant contributions to the field. His efforts continue to influence advancements in display and memory technologies.