Gökhan Percin

Title: Gökhan Percin: Innovator in Optical Proximity Correction

Introduction

Gökhan Percin is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of optical proximity correction (OPC) through his innovative methods and technologies. His work focuses on enhancing the accuracy and efficiency of integrated circuit manufacturing processes.

Latest Patents

Gökhan Percin holds a patent for a "Method for real time monitoring and verifying optical proximity correction model and method." This invention addresses the need for accurate and precise models that describe the optical, physical, and chemical processes involved in lithography. The patented method allows for real-time verification and monitoring of calibrated models on production or monitor wafers. By placing optical proximity corrected (OPC-ed) test and verification structures on scribe lines or cut lines, critical dimensions and images can be monitored effectively across the wafer and exposure field.

Career Highlights

Gökhan Percin is currently employed at Invarium, Inc., where he continues to develop and refine his innovative approaches to optical proximity correction. His expertise in this area has positioned him as a valuable asset in the semiconductor industry.

Collaborations

Throughout his career, Gökhan has collaborated with esteemed colleagues such as Ram S Ramanujam and Franz X Zach. These partnerships have further enhanced his research and development efforts in the field of optical proximity correction.

Conclusion

Gökhan Percin's contributions to the field of optical proximity correction demonstrate his commitment to advancing technology in semiconductor manufacturing. His innovative methods and collaborative spirit continue to influence the industry positively.