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For the Inventor, By the Inventor

Miyagi, Japan

Gyeong Min Park

This inventor holds 7 USPTO granted patents and 6 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gyeong Min Park. Retrieved from https://idiyas.com/inventor/gyeong-min-park-ud7ia3eu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 85.7

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal7 out of 10,947 
 
Tokyo Electron Limited
 patents

Years Active: 2024-2026

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7 patents (USPTO):Explore Patents
1. 12776479 - Substrate treatment system (2026-10-27),
2. 12482638 - Substrate processing apparatus and shutter (2025-11-25),
3. 12469738 - Substrate support, plasma processing apparatus, and ring replacement method (2025-11-11),
4. 12354849 - Plasma processing apparatus (2025-07-08),
5. 12308221 - Substrate processing system and method for installing edge ring (2025-05-20),
6. 12165893 - Substrate processing system and transfer method (2024-12-10),
7. 12165854 - Substrate support and substrate processing apparatus (2024-12-10),

Title: Gyeong Min Park: Innovator in Substrate Processing Technology

Introduction

Gyeong Min Park is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 7 patents. His innovative designs and solutions have advanced the capabilities of various processing apparatuses.

Latest Patents

Among his latest patents is a substrate processing apparatus that features a substrate support within a chamber. This apparatus includes a shutter with a valve body that opens and closes the chamber's opening, along with a baffle plate that has a vertically inclined portion. Additionally, a contact member made of a conductive elastic material is positioned on the substrate support's side surface, ensuring contact when the shutter is closed. Another notable patent involves a substrate support that comprises multiple rings and a lifter mechanism, designed to enhance the efficiency of substrate processing.

Career Highlights

Gyeong Min Park is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that improve substrate processing efficiency and reliability.

Collaborations

He has collaborated with notable colleagues such as Nobutaka Sasaki and Shin Matsuura, contributing to various innovative projects within the company.

Conclusion

Gyeong Min Park's contributions to substrate processing technology exemplify his dedication to innovation and excellence in his field. His patents reflect a commitment to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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